Integrated process feasibility of hard-mask for tight pitch interconnects fabrication (MEMS and Nanotechnology)
Spin on Hard-Mask Material - diagram, schematic, and image 08
New silicon hard mask material development for sub-5nm node
![PDF] Chromium oxide as a hard mask material better than metallic chromium | Semantic Scholar](https://d3i71xaburhd42.cloudfront.net/56b1bb76acd51804dcf35a31d1cbcb20934471f3/3-Figure1-1.png "PDF] Chromium oxide as a hard mask material better than metallic chromium | Semantic Scholar")
PDF] Chromium oxide as a hard mask material better than metallic chromium | Semantic Scholar
SPIE 2021 – Applied Materials – DRAM Scaling - SemiWiki
BUSINESS > Semiconductor Materials | DONGJIN SEMICHEM
Progress in Spin-on Hard Mask Materials for Advanced Lithography | Semantic Scholar
Spin-on Dual Hard Mask Material | JSR Micro, Inc.
Simplified process flow illustrating (a) "via-first" and (b)... | Download Scientific Diagram
PDF) Sub-100 nm silicon-nitride hard-mask for high aspect-ratio silicon fins
Etching with a hard mask - Plasma Etching - Texas Powerful Smart
Integrated process feasibility of hard-mask for tight pitch interconnects fabrication (MEMS and Nanotechnology)
Integrated process feasibility of hard-mask for tight pitch interconnects fabrication (MEMS and Nanotechnology)
Semiconductor Process Materials|Semiconductor material: etc
PDF) Impact of Sacrificial Hard Mask Material in BEOL Integration in Advanced Technology
Improvement of high resolution lithography by using amorphous carbon hard mask - ScienceDirect
NIL_vs_NEP-768x604.png
Materials | Free Full-Text | A Novel Dry Selective Isotropic Atomic Layer Etching of SiGe for Manufacturing Vertical Nanowire Array with Diameter Less than 20 nm
KR20160110657A - Polymer for hard mask, hard mask composition including the polymer, and method for forming pattern of semiconductor device using the hard mask composition - Google Patents
Spin-on Dual Hard Mask Material | JSR Micro, Inc.
Si Hardmask (Si-HM), EUV And Zero Defects
